Micro/nano structure written via sheath gas assisted EHD jet

Abstract

Laminar sheath gas is introduced into the Electrohydrodynamic Direct-Write (EDW) to promote the stability of charged jet and deposition precision of printed micro/nano structure. A novel EDW spinneret with sheath gas is designed to fabricate fine 1D micro/nano structure under lower applied voltage. The laminar sheath gas restricts the whipping motion of charged jet as well as decreases the required voltage. With the help of stretch force stems from sheath gas, the initiation voltage and sustaining voltage of EDW can be decreased obviously; the average diameter of micro/nano structure can be decreased from 21.58μm to 505.58nm. Different patterns can be also obtained by adjusting the moving speed of the collector in a sheath gas cases. Therefore, it can be concluded that provides a unique way for the precision deposition and integration of EDW micro/nano structure with in the micro/nanosystems.