Noise performance of 90 nm CMOS technology

D. Becher, G. Banerjee, R. Basco, C. Hung, K. Kuhn, W. Shih
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引用次数: 8

Abstract

This work describes the noise figure performance of CMOS transistors at the 90 nm technology node. Noise parameters are measured from 2-18 GHz, resulting in a minimum noise figure less than 2 dB across the range of measured frequencies for both NMOS and PMOS. Data is presented showing the effect of total gate width, gate length, and bias on the noise parameters.
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90纳米CMOS技术的噪声性能
本文描述了CMOS晶体管在90nm工艺节点上的噪声系数性能。噪声参数测量范围为2-18 GHz,因此在NMOS和PMOS的测量频率范围内,最小噪声系数小于2 dB。数据显示了总栅极宽度、栅极长度和偏置对噪声参数的影响。
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