{"title":"Plasma processes for formation of electronic structures with wide bandgap material layers","authors":"A. Jakubowski, R. B. Beck, J. Szmidt, A. Werbowy","doi":"10.1109/WBL.2001.946547","DOIUrl":null,"url":null,"abstract":"The authors discuss the role of plasma processing in standard Si vs. wide bandgap materials technology. They consider the specific problems of plasma processing and their consequences in wide band gap semiconductor technology.","PeriodicalId":315832,"journal":{"name":"3rd International Conference 'Novel Applications of Wide Bandgap Layers' Abstract Book (Cat. No.01EX500)","volume":"16 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"3rd International Conference 'Novel Applications of Wide Bandgap Layers' Abstract Book (Cat. No.01EX500)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/WBL.2001.946547","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The authors discuss the role of plasma processing in standard Si vs. wide bandgap materials technology. They consider the specific problems of plasma processing and their consequences in wide band gap semiconductor technology.
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