{"title":"Sub-0.2 micron gate lithography using E-beam, X-ray and optical technologies-an overview","authors":"L. Studebaker","doi":"10.1109/GAAS.1994.636993","DOIUrl":null,"url":null,"abstract":"The number of options for performing sub-0.2 um GaAs FET gate lithography has expanded recently to include shaped-beam e-beam systems, prototype X-ray steppers and optical steppers using phase-shift mask (PSM) technology. An overview of the alternatives is presented which may aid in selection of the \"best\" technology option for a given application.","PeriodicalId":328819,"journal":{"name":"Proceedings of 1994 IEEE GaAs IC Symposium","volume":"60 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 1994 IEEE GaAs IC Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GAAS.1994.636993","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
The number of options for performing sub-0.2 um GaAs FET gate lithography has expanded recently to include shaped-beam e-beam systems, prototype X-ray steppers and optical steppers using phase-shift mask (PSM) technology. An overview of the alternatives is presented which may aid in selection of the "best" technology option for a given application.
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