TiO2-UV detection under different types of acids and rinsing process for films preparation

Abstract

Titanium dioxide (TiO2) films were prepared by the sol–gel method under different types of acids. Effect of hydrochloric acid (HCl), nitric acid (HNO3) and nature-based solutions (NBS) under ultraviolet (UV) detection of films were investigated. Films were coated by dip coating on glass substrate. Moreover, TiO2 films were compared properties on water rinsing (Ri) and without rinsing (WRi) processes. The phase structure of prepared samples was characterized by means of X-ray powder diffraction (XRD). The results confirm that films were highly crystalline anatase TiO2 and free from other phases of titanium dioxide. For the optical property, the transmittance (%T) observed sharp rise in the violet-ultraviolet transition region and a maximum transmittance of ~80%. Photocurrents were measured under UV intensity of 260 mWcm–2 and DC bias voltage of -20 – 20 volts (V). The results observed that currents increased as bias voltage increased. Current - Voltage (I-V) curves observed different slopes under the different of acids and rinsing process. The photocurrent of TiO2-NBS-Ri was greater than TiO2-HCl-WRi and TiO2-HNO3-WRi of 10 and 20 times; respectively. These findings suggest that the significant effect of the acid and rinsing process on crystalline, morphological, optical, and electrical properties of nanostructured TiO2 films would be useful for applying the device in UV photoelectric detection.