The Mechanisms of Current Induced Degradation in a GaAs Light Emitting Diode

E. F. Thomas
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引用次数: 2

Abstract

The degradation of radiant power output (Po) for silicon doped GaAs infrared emitting diodes was established for dc current stress levels ranging from 70 to 175 A/cm2. Through an analysis of the forward I-V data and specially performed tests, it was de-termined that the initial degradation was due to increases in the space charge recom-bination current while later degradation was due to decreases in the diffusion current. The initial changes in the space charge recombination current were caused by the diffusion of zinc atoms to the junction region via the Longini mechanism. Zinc diffusion also resulted in an initial increase in Po both under stress and room temperature storage conditions. The mechan-ism responsible for the decrease in the diffusion current was not identified, but most probably involved the silicon dopant atoms.
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GaAs发光二极管中电流诱导降解的机理
在70 ~ 175 A/cm2的直流电流应力水平下,掺硅砷化镓红外发光二极管的辐射功率输出(Po)发生了衰减。通过对前向I-V数据的分析和专门进行的测试,确定了初始降解是由于空间电荷复合电流的增加,而后期降解是由于扩散电流的减少。空间电荷复合电流的初始变化是由锌原子通过Longini机制向结区扩散引起的。在应力和室温储存条件下,锌的扩散也导致了Po的初始增加。扩散电流减小的机制尚未确定,但很可能与硅掺杂原子有关。
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