A stage—gate methodology for new semiconductor technology development

Abstract

A stage-gate based methodology has been created to develop new semiconductor technologies. Each stage, gates and deliverable of some of the critical features are described for the benefit of the reader. This methodology has been in place and been successfully used for over six years to develop new semiconductor technologies. There have been several positive outcomes by using the methodology. It creates discipline in the organization. The methodology is getting adopted and the organizational familiarity is increasing. With increasing adoption throughout the corporation, other corporate infastructural systems start linking with it. As a result the corporate management can easily gain pertinent information on development progress of the new technology platforms. In implementing the methodology, there are several challenges ranging from corporate stamina to individual acceptance. In some circles following the methodology may be viewed as bureaucratic and slow. Overcoming these challenges instills the methodology with deeper roots, and improves its probability of success.