Substrate current protection in smart power IC's

O. Gonnard, G. Charitat, P. Lance, E. Stefanov, M. Suquet, M. Bafleur, N. Mauran, A. Peyre-Lavigne
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引用次数: 33

Abstract

In this paper, we describe and characterize a parasitic current, called substrate current injection in a SMART POWER technology. This parasitic current occurs when a normally reversed bias diode becomes forward biased and can disrupt the normal IC's functionality. We propose two design solutions able to decrease this parasitic current influence. These solutions, based on 2D simulation and on real-size measurements, are fully compatible with a standard technological process. The first one, consists in a correct guard ring polarization, in this case we can divide by 3 the injected current. The second one, based upon a special alignment for the N buried layer can decrease the parasitic current by a factor of 10.
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智能功率集成电路中的衬底电流保护
在本文中,我们描述和表征了一种寄生电流,即SMART POWER技术中的衬底电流注入。当一个正常反向的偏置二极管变成正向偏置时,这种寄生电流就会发生,并且会破坏正常的集成电路的功能。我们提出了两种能够减少寄生电流影响的设计方案。这些基于二维仿真和实际尺寸测量的解决方案与标准技术流程完全兼容。第一个,包含一个正确的保护环极化,在这种情况下,我们可以除以3注入电流。第二种方法,基于对N埋层的特殊排列,可以将寄生电流降低10倍。
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