{"title":"Optimization of Manufacturing of Operational Amplifier Manufactured by Using Field-effect Heterotransistor to Decrease Their Dimensions","authors":"E. Pankratov","doi":"10.13189/UJMS.2019.070202","DOIUrl":null,"url":null,"abstract":"In this paper we introduce an approach to decrease dimensions of operational amplifier based on field-effect heterotransistors. Dimensions of the elements will be decreased due to manufacture heterostructure with specific structure, doping of required areas of the heterostruc-ture by diffusion or ion implantation and optimization of annealing of dopant and/or radiation defects.","PeriodicalId":375998,"journal":{"name":"Universal Journal of Materials Science","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Universal Journal of Materials Science","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.13189/UJMS.2019.070202","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this paper we introduce an approach to decrease dimensions of operational amplifier based on field-effect heterotransistors. Dimensions of the elements will be decreased due to manufacture heterostructure with specific structure, doping of required areas of the heterostruc-ture by diffusion or ion implantation and optimization of annealing of dopant and/or radiation defects.
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