From nanoparticles to nanostructures for plasmonic-related applications (Presentation Recording)

B. Ren, Bowen Liu, Xu Yao, Shu Chen, Liang Zhang, Lei Wang, Zhilin Yang
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Abstract

Compared with some precise nanofabrication methods, such as EBL and FIB, holographic lithography (HL) is a convenient way to fabricate periodic structures in a large area and with superb uniformity. In this work, we developed the deep UV HL with 266 nm laser to obtain structure with a periodicity between 100 nm to 1μm, which cannot be achieved by traditional photolithography. We further developed a strategy to fabricate hybrid periodical dimmer arrays by deep UV HL and lift-off process, followed by selectively surface functionalization. Thermal treatment was employed to as an effective approach to tune the gap size, which provides an additionally adjustable factor. By coating the substrate with gold and the obtained nanostructures with gold or silver, we have obtained periodic plasmonic structure with excellent figure of merit based on refractive index change and strong and uniform SER activity. Such a hybrid periodical dimmer arrays can be used as an effective plasmonics structure, and have potential application as a platform for high-efficiency surface- and bio- analysis.
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等离子体相关应用从纳米颗粒到纳米结构(演讲记录)
与EBL和FIB等精密纳米加工方法相比,全息光刻(HL)是一种制造大面积、均匀性好的周期结构的简便方法。本文利用266nm激光制备了深紫外光HL,获得了传统光刻技术无法实现的周期性在100 nm ~ 1μm之间的结构。我们进一步开发了一种通过深紫外HL和提升工艺制备混合周期性调光器阵列的策略,然后进行选择性表面功能化。热处理是一种有效的调整间隙大小的方法,它提供了一个额外的可调节因子。通过在衬底上涂上金,并在纳米结构上涂上金或银,我们获得了具有优异折射率变化和强而均匀的SER活性的周期性等离子体结构。这种混合周期性调光阵列可以作为一种有效的等离子体结构,并具有作为高效表面和生物分析平台的潜在应用前景。
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