Post-placement temperature reduction techniques

Wei Liu, A. Nannarelli, A. Calimera, E. Macii, M. Poncino
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引用次数: 3

Abstract

With technology scaled to deep submicron era, temperature and temperature gradient have emerged as important design criteria. We propose two post-placement techniques to reduce peak temperature by intelligently allocating whitespace in the hotspots. Both methods are fully compliant with commercial technologies, and can be easily integrated with state-of-the-art thermal-aware design flow. Experiments in a set of tests on circuits implemented in STM 65nm technologies show that our methods achieve better peak temperature reduction than directly increasing circuit's area.
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放置后温度降低技术
随着技术规模进入深亚微米时代,温度和温度梯度已成为重要的设计标准。我们提出了两种后置技术,通过智能分配热点的空白来降低峰值温度。这两种方法都完全符合商业技术,并且可以很容易地与最先进的热感知设计流程集成。在采用STM 65nm技术实现的电路上进行的一系列测试表明,我们的方法比直接增加电路面积实现了更好的峰值温度降低。
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