Wei Liu, A. Nannarelli, A. Calimera, E. Macii, M. Poncino
{"title":"Post-placement temperature reduction techniques","authors":"Wei Liu, A. Nannarelli, A. Calimera, E. Macii, M. Poncino","doi":"10.1109/DATE.2010.5457127","DOIUrl":null,"url":null,"abstract":"With technology scaled to deep submicron era, temperature and temperature gradient have emerged as important design criteria. We propose two post-placement techniques to reduce peak temperature by intelligently allocating whitespace in the hotspots. Both methods are fully compliant with commercial technologies, and can be easily integrated with state-of-the-art thermal-aware design flow. Experiments in a set of tests on circuits implemented in STM 65nm technologies show that our methods achieve better peak temperature reduction than directly increasing circuit's area.","PeriodicalId":432902,"journal":{"name":"2010 Design, Automation & Test in Europe Conference & Exhibition (DATE 2010)","volume":"319 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 Design, Automation & Test in Europe Conference & Exhibition (DATE 2010)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DATE.2010.5457127","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
With technology scaled to deep submicron era, temperature and temperature gradient have emerged as important design criteria. We propose two post-placement techniques to reduce peak temperature by intelligently allocating whitespace in the hotspots. Both methods are fully compliant with commercial technologies, and can be easily integrated with state-of-the-art thermal-aware design flow. Experiments in a set of tests on circuits implemented in STM 65nm technologies show that our methods achieve better peak temperature reduction than directly increasing circuit's area.