Investigation of InP/InGaAs pnp /spl delta/-doped heterojunction bipolar transistor

J. Tsai, King-Poul Zhu, Ying-Cheng Chu, S. Chiu
{"title":"Investigation of InP/InGaAs pnp /spl delta/-doped heterojunction bipolar transistor","authors":"J. Tsai, King-Poul Zhu, Ying-Cheng Chu, S. Chiu","doi":"10.1109/ESSDER.2004.1356584","DOIUrl":null,"url":null,"abstract":"An InP/InGaAs /spl delta/-doped pnp heterojunction bipolar transistor (HBT) has been successfully fabricated and demonstrated for the first time. The addition of a /spl delta/-doped sheet between two undoped spacer layers more effectively eliminates the potential spike at the emitter-base junction, lowers the emitter-collector offset voltage, and increases the effective barrier for electrons, simultaneously. A maximum current gain of 50 and a low offset voltage of 70 mV are obtained, respectively. To our knowledge, the offset voltage of the studied device is the best reported for InP/InGaAs pnp HBTs.","PeriodicalId":287103,"journal":{"name":"Proceedings of the 30th European Solid-State Circuits Conference (IEEE Cat. No.04EX850)","volume":"165 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 30th European Solid-State Circuits Conference (IEEE Cat. No.04EX850)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSDER.2004.1356584","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

An InP/InGaAs /spl delta/-doped pnp heterojunction bipolar transistor (HBT) has been successfully fabricated and demonstrated for the first time. The addition of a /spl delta/-doped sheet between two undoped spacer layers more effectively eliminates the potential spike at the emitter-base junction, lowers the emitter-collector offset voltage, and increases the effective barrier for electrons, simultaneously. A maximum current gain of 50 and a low offset voltage of 70 mV are obtained, respectively. To our knowledge, the offset voltage of the studied device is the best reported for InP/InGaAs pnp HBTs.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
InP/InGaAs pnp /spl δ /掺杂异质结双极晶体管的研究
首次成功制备并演示了InP/InGaAs /spl δ /掺杂pnp异质结双极晶体管(HBT)。在两个未掺杂的间隔层之间添加a/ spl δ /掺杂片,更有效地消除了发射极-基极结处的电位尖峰,降低了发射极-集电极的偏置电压,同时增加了电子的有效势垒。最大电流增益为50,低失调电压为70毫伏。据我们所知,所研究器件的偏置电压是InP/InGaAs pnp HBTs的最佳报道。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Bias stress in pentacene transistors measured by four probe transistor structures Interface passivation mechanisms in metal gated oxide capacitors Modeling of STI-induced stress phenomena in CMOS 90nm Flash technology A novel method for forming gate spacer and its effects on the W/WN/sub x//poly-Si gate stack Gate-capacitance extraction from RF C-V measurements [MOS device applications]
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1