The determination of interfacial and bulk properties of gold in m.o.s. structures using quasiequilibrium and non-steady-state linear voltage-ramp techniques

L. Faraone, A. G. Nassibian, J. Simmons
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引用次数: 2

Abstract

The effect of gold recombination centres on the trapping state at the Si-SiO2interface, and in the bulk, has been studied. The technique involves applying a linear voltage-ramp to the m.o.s. device and measuring the resulting I/V characteristic. From the quasiequilibrium I/V curves, it is apparent that gold-doping produces a pronounced peak in the interfacial trap distribution occuring at energy Ev + 0.6eV with a density of Nss = 2.5 × 1011(cm2eV)−1. Subsequent non-steady-state I/V measurements are used to study the bulk recombination properties of gold, and thus determine a value for the capture cross-section (σp ≃ 1.1 × 10−15 cm2).
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用准平衡和非稳态线性电压斜坡技术测定m.o.s结构中金的界面和体积性质
研究了金复合中心对si - sio2界面和体中俘获态的影响。该技术包括对mos器件施加线性电压斜坡并测量由此产生的I/V特性。从准平衡I/V曲线可以明显看出,在能量Ev + 0.6eV,密度Nss = 2.5 × 1011(cm2eV)−1的界面阱分布中,金掺杂产生了一个明显的峰。随后的非稳态I/V测量用于研究金的体复合特性,从而确定捕获截面的值(σp≃1.1 × 10−15 cm2)。
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