High temperature static and dynamic characteristics of 3.7 kV high voltage 4H-SiC JBS

K. Asano, T. Hayashi, R. Saito, Y. Sugawara
{"title":"High temperature static and dynamic characteristics of 3.7 kV high voltage 4H-SiC JBS","authors":"K. Asano, T. Hayashi, R. Saito, Y. Sugawara","doi":"10.1109/ISPSD.2000.856781","DOIUrl":null,"url":null,"abstract":"A new high voltage Junction Barrier controlled Schottky (JBS) diode has been fabricated using 4H-SiC. This diode has some field reduction regions in the active area of a Schottky barrier diode (SBD). These regions can reduce the electric field at the Schottky barrier in the reverse blocking state, and can reduce the leakage current. By adopting the proper SBD metal, fine patterning and optimized structures, we succeeded in improving the trade-off between the blocking voltage (BV) and the specific on-resistance, and achieved a new record high BV of 3.7-3.9 kV and top-level specific on-resistance of 31.4-40.2 m/spl Omega/cm/sup 2/ for the first time. The newly developed JBS has a very fast recovery time t/sub /spl tau//spl tau// of 9.7 ns, which is about 10% that of the Si high-speed diode t/sub /spl tau//spl tau// and high voltage 4H-SiC pn diode. Furthermore, the dynamic characteristics of the developed JBS are almost constant at high temperatures up to 550 K.","PeriodicalId":260241,"journal":{"name":"12th International Symposium on Power Semiconductor Devices & ICs. Proceedings (Cat. No.00CH37094)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"20","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"12th International Symposium on Power Semiconductor Devices & ICs. Proceedings (Cat. No.00CH37094)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2000.856781","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 20

Abstract

A new high voltage Junction Barrier controlled Schottky (JBS) diode has been fabricated using 4H-SiC. This diode has some field reduction regions in the active area of a Schottky barrier diode (SBD). These regions can reduce the electric field at the Schottky barrier in the reverse blocking state, and can reduce the leakage current. By adopting the proper SBD metal, fine patterning and optimized structures, we succeeded in improving the trade-off between the blocking voltage (BV) and the specific on-resistance, and achieved a new record high BV of 3.7-3.9 kV and top-level specific on-resistance of 31.4-40.2 m/spl Omega/cm/sup 2/ for the first time. The newly developed JBS has a very fast recovery time t/sub /spl tau//spl tau// of 9.7 ns, which is about 10% that of the Si high-speed diode t/sub /spl tau//spl tau// and high voltage 4H-SiC pn diode. Furthermore, the dynamic characteristics of the developed JBS are almost constant at high temperatures up to 550 K.
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3.7 kV高压4H-SiC JBS高温静、动态特性
利用4H-SiC材料制备了一种新型高压结势垒控制肖特基二极管。该二极管在肖特基势垒二极管(SBD)的有源区有一些场还原区。这些区域可以减小反向阻断状态下肖特基势垒处的电场,从而减小泄漏电流。通过采用合适的SBD金属、精细的图形和优化的结构,我们成功地改善了阻塞电压(BV)和比导通电阻之间的权衡,并首次实现了3.7 ~ 3.9 kV的最高BV和31.4 ~ 40.2 m/spl Omega/cm/sup 2/的顶层比导通电阻。新开发的JBS具有非常快的恢复时间t/sub /spl tau//spl tau// 9.7 ns,约为Si高速二极管t/sub /spl tau//spl tau//和高压4H-SiC pn二极管的10%。此外,在高达550 K的高温下,所制备的JBS的动态特性几乎不变。
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