A high-isolation ku-band SPDT switch in 0.35μm SiGe BiCMOS technology

ZhengLe Fan, Kaixue Ma, Shouxian Mou, F. Meng
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Abstract

In this paper, a compact high-isolation Ku-band SPDT switch using triple-well transistors based on 0.35μm SiGe BiCMOS process is proposed. Improved series-shunt-shunt topology is used in this design to enhance the isolation and to reduce the insertion loss simultaneously. In order to improve the power handling capability, body-floating transistor is employed and analyzed. The full-wave simulated results show that the insertion loss of the ON state path is better than 1.76 dB, and the isolation of the OFF state path is higher than 40.8 dB in the entire designed frequency band of 14–18 GHz. The output P1dB of the ON state path at center frequency 16 GHz is 10.51dBm, and the core area of this SPDT is only 0.36×0.41 mm2 excluding testing pads.
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采用0.35μm SiGe BiCMOS技术的高隔离ku波段SPDT开关
本文提出了一种基于0.35μm SiGe BiCMOS工艺的三井晶体管高隔离ku波段SPDT开关。本设计采用改进的串联-并联-并联拓扑结构,增强了隔离性,同时降低了插入损耗。为了提高晶体管的功率处理能力,采用了浮体晶体管并对其进行了分析。全波仿真结果表明,在整个设计频带14 ~ 18 GHz范围内,ON状态路的插入损耗优于1.76 dB, OFF状态路的隔离优于40.8 dB。在中心频率16 GHz时,ON状态路径的输出P1dB为10.51dBm,该SPDT的核心区仅为0.36×0.41 mm2,不包括测试垫。
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