Comparison of electric field dependent activation energy for electroformation in TaOx and TiOx based RRAMs

Abhishek A. Sharma, M. Noman, M. Skowronski, J. Bain
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引用次数: 4

Abstract

Oxide based resistive switching memories are considered to be one of the front-runners for the next generation non-volatile memories. Forming, the critical one time programming process, is not well understood. In this work, we try to understand the dynamics of forming process in two model systems - TaOx and TiOx, and compare the similarities and the universality in its control parameters. After comparing the time, voltage and temperature dependent dynamics, we find that a 1/E (E being electric field) dependence causes the activation energy to reduce by more than an order of magnitude.
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TaOx和TiOx基rram中电场依赖性电生成活化能的比较
基于氧化物的电阻开关存储器被认为是下一代非易失性存储器的领跑者之一。成形这一关键的一次性编程过程还没有得到很好的理解。在这项工作中,我们试图了解两种模型系统- TaOx和TiOx的成形过程动力学,并比较其控制参数的相似性和通用性。在比较了时间、电压和温度相关的动态后,我们发现1/E (E为电场)相关导致活化能降低了一个数量级以上。
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