Advanced flash memory technology and trends for file storage application

S. Aritome
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引用次数: 38

Abstract

This paper describes a high density flash memory technology suitable for file storage application. Requirements for file storage memory are low cost, high-speed programming and erasing, low power consumption and good endurance characteristics. In order to satisfy these requirements, key technologies of self-aligned STI (SA-STI) cell, uniform FN-FN program/erase scheme and multi-level-cell (MLC) technology have been developed. By using SA-STI technology, small cell size of 4F/sup 2/ (F: feature size) can be realized. Reliable tunnel oxide can be also obtained because the floating gate does not overlap the STI corner. As a result, reliable 512 Mbit flash memories with 0.145 um/sup 2/ cell size under 0.175 /spl mu/m design rule have been newly developed based on these technologies, as well as 0.25 /spl mu/m 256 Mbit. Moreover, MLC technology combined with this small cell size of 4F/sup 2/ can reduce bit cost more, and can expand the file storage market in the near future.
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先进的闪存技术和文件存储应用的趋势
本文介绍了一种适用于文件存储的高密度闪存技术。对文件存储存储器的要求是低成本、高速编程和擦除、低功耗和良好的耐用性。为了满足这些需求,研究开发了自对准STI (SA-STI)单元、均匀FN-FN程序/擦除方案和多级cell (MLC)技术等关键技术。利用SA-STI技术,可以实现4F/sup 2/ (F:特征尺寸)的小单元尺寸。可靠的隧道氧化物也可以获得,因为浮动栅极不重叠STI角。因此,在这些技术的基础上,新开发出了0.175 /spl mu/m设计规则下,单元尺寸为0.145 um/sup 2/ /的可靠512 Mbit闪存,以及0.25 /spl mu/m的256 Mbit闪存。此外,MLC技术与4F/sup /的小单元尺寸相结合,可以进一步降低比特成本,并在不久的将来扩大文件存储市场。
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