Automation of the Process of Ultrathin Two-Component Films Deposition from Two Sputtering Sources

Abstract

The article considers the results of designing structure and development of the control algorithm of the shutter system for applying two-component ultrathin WSi films at the VUP-11M vacuum coating system with a rotating substrate holder. The algorithm of the operator’s operation in manual mode for obtaining two-component films is analyzed and its disadvantages are described. A procedure has been developed for combining the angle of the substrate in the program and the angle of the substrate in the vacuum chamber. The interface and algorithm of the program for controlling a stepper motor are described. The program allows to rotate the substrate and see its position on the equipment scheme from above. In the tab widget, the operator can calibrate the position of the substrate, rotate the substrate by a given angle, rotate the substrate around its axis or between certain angles for a specified time or number of times, and carry out the process of deposition of two-component films in automatic mode. The use of an automatic film deposition mode increases the reproducibility of film properties.