Optimization of thin film deposition using multi-parametric surface plasmon resonance: A new technique to determine thickness and refractive index of thin and thick layers
J. Kuncova-Kallio, Jussipekka Tuppurainen, Janusz W. Sadowski, Niko Granqvist
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引用次数: 0
Abstract
We present a new method for measuring thicknesses and refractive indices of ultrathin, thin and relatively thick films by using multi-parametric surface plasmon resonance (MP-SPR). The layers measured can be multiple layers of organic, inorganic, metallic, and it is also possible to follow interaction kinetics of interaction components with all these materials. In this paper, MP-SPR is applied as a method for optimization of thin film deposition, here vacuum evaporation.
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