Hybrid lithography system for MEMS/NEMS

Abstract

Micro/nano structures are involved in MEMS/NEMS, SPs sensors, and optical devices with kinetic optical effects, which cannot be mixture fabricated on curved surface by conventional lithography for the frozen processing in the vertical direction. In this letter, a hybrid-lithography system for micro/nano structures is proposed, which mainly consists of a spatial light modulator (SLM), binary phase light modulator (PLM) and UV optical head equipped with position sensor. It is the SLM and PLM as well as auto-optical focusing (AOF) and Z-correction that make micro/nano hybrid fabrication on bended surface available. The proposed system could automatically focus on the photoresist surface with accuracy of 0.3 μm in Z-direction and achieve minimum feature size of 100 nm at 351 nm lithography wavelength. The obtained maximum speed of 2400 mm2/min is the fastest one in the world, when the system flying exposes with 3D navigation under the beam-tiled-flash-patterning (BTFP) scan mode.