J. Franco, B. Kaczer, P. Roussel, M. Toledano-Luque, P. Weckx, T. Grasser
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引用次数: 7
Abstract
We report statistical NBTI datasets of nanoscale Si/SiON pMOSFETs. Weibull-distributed single-defect-induced ΔVth are observed in the NBTI relaxation transients, in contrast with literature reports of exponential distribution. We discuss the (ir)relevance of a correct description of the single-defect-induced ΔVth steps for describing the total BTI induced ΔVth distribution. We show that the BTI induced Vth variance can be correctly predicted based on time-zero Vth0-variability only.