Relevance of non-exponential single-defect-induced threshold voltage shifts for NBTI variability

J. Franco, B. Kaczer, P. Roussel, M. Toledano-Luque, P. Weckx, T. Grasser
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引用次数: 7

Abstract

We report statistical NBTI datasets of nanoscale Si/SiON pMOSFETs. Weibull-distributed single-defect-induced ΔVth are observed in the NBTI relaxation transients, in contrast with literature reports of exponential distribution. We discuss the (ir)relevance of a correct description of the single-defect-induced ΔVth steps for describing the total BTI induced ΔVth distribution. We show that the BTI induced Vth variance can be correctly predicted based on time-zero Vth0-variability only.
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非指数单缺陷引起的阈值电压偏移与NBTI可变性的相关性
我们报告了纳米级Si/SiON pmosfet的统计NBTI数据集。与文献报道的指数分布相反,在NBTI弛豫瞬态中观察到威布尔分布的单缺陷诱导ΔVth。我们讨论了正确描述单一缺陷引起的ΔVth步骤与描述总BTI引起的ΔVth分布的相关性。我们证明了BTI诱导的Vth方差仅基于时间零Vth变异性可以正确预测。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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