Challenges in LER/CDU metrology in DSA: placement error and cross-line correlations

SPIE Advanced Lithography Pub Date : 2016-03-25 DOI:10.1117/12.2230849

V. Constantoudis, V. Kuppuswamy, E. Gogolides, A. V. Pret, H. Pathangi, R. Gronheid

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引用次数: 1

Abstract

DSA lithography poses new challenges in LER/LWR metrology due to its self-organized and pitch-based nature. To cope with these challenges, a novel characterization approach with new metrics and updating the older ones is required. To this end, we focus on two specific challenges of DSA line patterns: a) the large correlations between the left and right edges of a line (line wiggling, rms(LWR)

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