UV fatigue of laser optics: laser-induced contamination

Laser Damage Pub Date : 2022-12-02 DOI:10.1117/12.2638404
B. Arnold, Cyrus Rashvand, L. Willis, M. Dabney
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引用次数: 1

Abstract

Laser-induced contamination (LIC) can be a major concern of using UV laser systems. Surface contamination occurs via interactions between the UV laser and particulates, water vapor condensate, organics, and airborne molecular contaminates (AMC) from the environment or outgassing from system materials. A brief review of contamination of optics will lead into present results from long-term 355 nm quasi-CW laser transmission experiments at Edmund Optics. Time lapse microscopy was used to monitor nucleation and growth of surface contaminants. Laser burn boxes were constructed for use as a controlled UV LIC testbed; experimental results are presented on transmission losses for various material preparation methods.
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激光光学的紫外疲劳:激光引起的污染
激光引起的污染(LIC)可能是使用紫外激光系统的主要问题。表面污染是通过紫外线激光与环境中的微粒、水蒸气冷凝物、有机物和空气中的分子污染物(AMC)或系统材料的排气之间的相互作用发生的。对光学污染的简要回顾将引出埃德蒙光学公司355nm准连续波激光长期传输实验的结果。时间推移显微镜用于监测表面污染物的成核和生长。激光燃烧箱被构建为一个受控的UV LIC测试平台;给出了各种材料制备方法的传输损耗实验结果。
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