N. Ceglio, A. Hawryluk, D. G. Steams, D. Gaines, R. Rosen, S. Vernon
{"title":"Soft X-ray Projection Lithography Technology*","authors":"N. Ceglio, A. Hawryluk, D. G. Steams, D. Gaines, R. Rosen, S. Vernon","doi":"10.1364/sxray.1991.wd1","DOIUrl":null,"url":null,"abstract":"Recent analyses of critical system issues in Soft X-ray Projection Lithography are discussed. An overall system design provides detailed requirements (specifications) for x-ray mirror reflectivity, source power and parameters, resist sensitivity, etc. A cost analysis for SXPL systems leads to important requirements for x-ray mirror technology. An analysis of power loading limitations on precision SXPL imaging optics has important implications for source power and x-ray mirror reflectivity requirements.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"51 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1991.wd1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Recent analyses of critical system issues in Soft X-ray Projection Lithography are discussed. An overall system design provides detailed requirements (specifications) for x-ray mirror reflectivity, source power and parameters, resist sensitivity, etc. A cost analysis for SXPL systems leads to important requirements for x-ray mirror technology. An analysis of power loading limitations on precision SXPL imaging optics has important implications for source power and x-ray mirror reflectivity requirements.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
