{"title":"Illumination Requirements for Optical Projectors: and how to think about them","authors":"D. Goodman","doi":"10.1364/sxray.1991.fb1","DOIUrl":null,"url":null,"abstract":"Illumination systems are often given too little thought, since the main lens in a projector is usually much more difficult, and because many of the effects of non-optimimum illumination are too small to be noticed in many applications. For modern chip lithography, however, nothing can be assumed negligible.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1991.fb1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Illumination systems are often given too little thought, since the main lens in a projector is usually much more difficult, and because many of the effects of non-optimimum illumination are too small to be noticed in many applications. For modern chip lithography, however, nothing can be assumed negligible.