High power and high efficiency GaN HEMT with WN Schottky barrier

Tangsheng Chen, Jianjun Zhou, C. Ren, Zhonghui Li, Shichang Zhong, Bin Zhang
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引用次数: 1

Abstract

In this paper, a high power and high efficiency L/S-band GaN HEMT with tungsten nitride (WN) Schottky barrier is presented. By employing WN Schottky barrier, the reaction between the gate electrode and AlGaN layer is minimized and the Schottky barrier reveals good thermal stability. At 2.2 GHz, the developed GaN HEMT with 1.25 mm gate periphery delivers an output power density of 3.3W/mm with 75% maximum power-added efficiency (PAE). The accelerated life test shows that the mean time to failure (MTTF) of the developed devices is 1.8×107 hours at 150°C channel temperature with an activation energy of 1.5 e V. Output power more than 90 W and PAE about 70% are obtained with a 2×12 mm gate periphery packaged device between 1.14 GHz and 1.24 GHz.
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具有WN肖特基势垒的大功率高效率GaN HEMT
本文提出了一种大功率、高效率的L/ s波段氮化钨肖特基势垒GaN HEMT。利用WN肖特基势垒,栅极电极与AlGaN层之间的反应最小化,肖特基势垒表现出良好的热稳定性。在2.2 GHz频段,采用1.25 mm栅极外围的GaN HEMT输出功率密度为3.3W/mm,最大附加功率效率(PAE)为75%。加速寿命试验表明,在150℃通道温度下,在1.5 ev的激活能下,所开发器件的平均失效时间(MTTF)为1.8×107小时,在1.14 GHz ~ 1.24 GHz范围内,2×12 mm栅极外围封装器件的输出功率大于90 W, PAE约为70%。
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