2D dynamic ionization simulation from ultrashort pulses in multilayer dielectric interference coatings

Laser Damage Pub Date : 2020-11-09 DOI:10.1117/12.2571081
Simin Zhang, A. Davenport, N. Talisa, Joseph R. Smith, C. Menoni, V. Gruzdev, E. Chowdhury
{"title":"2D dynamic ionization simulation from ultrashort pulses in multilayer dielectric interference coatings","authors":"Simin Zhang, A. Davenport, N. Talisa, Joseph R. Smith, C. Menoni, V. Gruzdev, E. Chowdhury","doi":"10.1117/12.2571081","DOIUrl":null,"url":null,"abstract":"The interaction of ultrafast laser pulses and dielectric materials has been under intensive research for improvement of laser induced damage of optics for high intensity lasers. A 2D model based on Keldysh photoionization and finite-different time-domain (FDTD) algorithm are used to simulate the ionization processes in multilayer interference coatings, taking nonlinear photoionization, impact ionization, and plasma collision into account. Simulation and experimental results of bulk fused silica with different pulse durations and angles of incidence are compared and discussed. We also simulated the interaction of a 40-layer SiO2/Ta2O5 high reflective interference coating designed for 45° angle of incidence and a p-polarized 5-fs pulse at a wavelength of 800 nm, and the damage threshold of the coating is estimated.","PeriodicalId":202227,"journal":{"name":"Laser Damage","volume":"34 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-11-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Laser Damage","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2571081","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

Abstract

The interaction of ultrafast laser pulses and dielectric materials has been under intensive research for improvement of laser induced damage of optics for high intensity lasers. A 2D model based on Keldysh photoionization and finite-different time-domain (FDTD) algorithm are used to simulate the ionization processes in multilayer interference coatings, taking nonlinear photoionization, impact ionization, and plasma collision into account. Simulation and experimental results of bulk fused silica with different pulse durations and angles of incidence are compared and discussed. We also simulated the interaction of a 40-layer SiO2/Ta2O5 high reflective interference coating designed for 45° angle of incidence and a p-polarized 5-fs pulse at a wavelength of 800 nm, and the damage threshold of the coating is estimated.
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多层介质干涉涂层中超短脉冲的二维动态电离模拟
超快激光脉冲与介质材料的相互作用是提高高强度激光致光学损伤性能的重要研究方向。采用基于Keldysh光电离和时域有限差分(FDTD)算法的二维模型,考虑非线性光电离、冲击电离和等离子体碰撞,模拟了多层干涉涂层中的电离过程。对不同脉冲持续时间和不同入射角下熔融石英的模拟结果和实验结果进行了比较和讨论。模拟了40层45°入射角的SiO2/Ta2O5高反射干涉涂层与波长为800 nm的p偏振5-fs脉冲的相互作用,并估计了涂层的损伤阈值。
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