Fabrication and testing of 980nm high-power VCSEL with AlN film passivation layer

Lifeng Hou, Yongfeng Ma, Yuan Feng
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引用次数: 1

Abstract

We report the fabrication and the testing of a novel high-power VCSEL with AlN film passivation layer in this paper. The analysis on the high-power VCSEL show that the AlN film passivation layer can improve the opto-electric characteristics of high-power VCSEL, reduce the thermal resistance of VCSEL and enhance the ability of the heat dissipation; The AlN film passivation layer and the SiO2 film passivation layer high-power VCSEL both with the same aperture have been made by the same processes on the same epitaxial wafer; the two kinds of high power VCSEL have been tested comparatively, the testing results show that the out power of the VCSEL on AlN film passivation layer is 470mW at room temperature, its characteristic temperature is 120K, it have the much better temperature and opto-electric characteristics than the device on the SiO2 film passivation layer.
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带AlN膜钝化层的980nm大功率VCSEL的制备与测试
本文报道了一种新型的具有AlN膜钝化层的大功率VCSEL的制备和测试。对大功率VCSEL的分析表明,AlN膜钝化层可以改善大功率VCSEL的光电特性,降低VCSEL的热阻,增强VCSEL的散热能力;采用相同的工艺在同一外延片上制备了具有相同孔径的AlN膜钝化层和SiO2膜钝化层高功率VCSEL;对两种高功率VCSEL进行了对比测试,测试结果表明,在室温下,AlN膜钝化层上的VCSEL输出功率为470mW,其特性温度为120K,具有比SiO2膜钝化层上的器件更好的温度和光电特性。
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