A 130 nm InP HBT integrated circuit technology for THz electronics

M. Urteaga, J. Hacker, Z. Griffith, A. Young, R. Pierson, P. Rowell, M. Seo, M. Rodwell
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引用次数: 24

Abstract

A 130 nm InP HBT IC technology has been developed capable of circuit demonstrations at > 600 GHz. Transistors demonstrate RF figures-of-merit ft > 500 GHz and fmax > 1 THz. The HBTs support high current densities > 25 mA/μm2 with a common-emitter breakdown voltage BVceo = 3.5 V. The technology includes a multi-level thin-film wiring environment capable of low-loss THz signal routing and high integration density. A large-signal HBT model has been developed capable of accurately predicting circuit performance at THz frequencies. Circuit demonstrations include fundamental oscillators and amplifiers operating at > 600 GHz as well as integrated transmitter and receiver circuits.
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一种用于太赫兹电子器件的130nm InP HBT集成电路技术
已经开发了一种130 nm InP HBT IC技术,能够在> 600 GHz的电路演示。晶体管的射频性能值ft > 500 GHz, fmax > 1 THz。hbt支持大于25 mA/μm2的高电流密度,共发射极击穿电压BVceo = 3.5 V。该技术包括多层薄膜布线环境,能够实现低损耗太赫兹信号路由和高集成密度。建立了一种能够准确预测太赫兹频率下电路性能的大信号HBT模型。电路演示包括工作在> 600ghz的基本振荡器和放大器,以及集成的发送和接收电路。
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