A new implemenation for RF SiCMOS transistor model using SDD for quantifying individual contribution to distortion from transistor’s nonlinear parameters

A. Abuelmaatti, I. Thayne, I. McGregor, E. Wasige
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引用次数: 2

Abstract

This work reports on a new implementation of a transistor model aiming for closer understanding of the nonlinear elements in silicon CMOS transistors operating at high frequencies. Using this model, the contribution of each source of distortion can be individually quantified using a superposition method. The new model is implemented entirely using symbolically defined devices (SDD) for each nonlinear parameter individually. The transistor used is a foundry 180nm RF CMOS transistor capable of operating up to 10GHz. The SDD model is validated by examining the nonlinear behavior of the model against the behavior of the modeled transistor in a one tone sweep test from very small powers up to beyond compression. This work was carried out using Agilent design systems tool (ADS).
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一种新的射频SiCMOS晶体管模型的实现,使用SDD来量化晶体管非线性参数对畸变的单个贡献
这项工作报告了一种新的晶体管模型的实现,旨在更深入地了解工作在高频下的硅CMOS晶体管中的非线性元素。使用该模型,可以使用叠加方法单独量化每个失真源的贡献。新模型完全使用符号定义器件(SDD)对每个非线性参数单独实现。所使用的晶体管是一个可工作频率高达10GHz的180nm RF CMOS晶体管。通过检查模型的非线性行为和模型晶体管在从非常小的功率到超过压缩的单音扫描测试中的行为来验证SDD模型。这项工作是使用安捷伦设计系统工具(ADS)进行的。
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