Seasoning Optimization by Using Optical Emission Spectroscopy

2020 International Symposium on Semiconductor Manufacturing (ISSM) Pub Date : 2020-12-15 DOI:10.1109/ISSM51728.2020.9377498

Masahiro Shiga, Haruki Omine, Masaki Kitsunezuka, Hironori Moki, Yuki Kataoka, Takahito Matsuzawa, Yasuhisa Suzuki, Yusuke Fukazawa, Tsuyoshi Makita, Kazuyuki Takasawa, Takuo Yamamoto, Takao Funakubo

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Abstract

From a point of view for AEC (Advanced/Autonomous Equipment Control) and APC (Advanced/Autonomous Process Control), it is necessary to catch up the condition from semiconductor manufacturing equipment in more detail and to monitor it more closely. After wet cleaning, it is difficult to determine the optimal number of seasoning wafers for the etch equipment. As a solution for this problem, the “Seasoning Index” that shows the progress of seasonings in the chamber is developed by using OES (Optical Emission Spectroscopy). Then, the Seasoning Optimizer function was implemented to make sure that the seasonings are performed appropriately. Furthermore, the principle of the seasoning process was also investigated. As a result, it was shown that the Seasoning Index, which shows similar behavior with the by-product of the reaction, is also effective as an index showing the seasoning state in the chamber. This case shows one of the application examples of AEC/APC.

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利用发射光谱法优化调味料

从AEC(先进/自主设备控制)和APC(先进/自主过程控制)的角度来看，有必要更详细地了解半导体制造设备的状况，并对其进行更密切的监控。湿法清洗后，难以确定蚀刻设备的最佳调味片数。为了解决这一问题，利用OES (Optical Emission Spectroscopy，光学发射光谱)开发了反映腔内调味进度的“调味指数”。然后，实现了调味优化器功能，以确保适当地执行调味。并对调味工艺的原理进行了探讨。结果表明，与反应副产物表现出相似行为的调味指数也可以作为反应室内调味状态的有效指标。本案例是AEC/APC的应用实例之一。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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2020 International Symposium on Semiconductor Manufacturing (ISSM)

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