Fabrication of nanoscale features on ultra-thin glass-based dielectrics via self-masking and preferential etching to enhance capacitance

Abstract

Flexible capacitors based on ultra-thin glass (30 μm thick) were fabricated and the effect of nanoscale surface modification on the dielectric properties was studied. The ultra-thin glass samples were partially masked by the deposition and self-organisation of Ag-islands and then preferentially etched to produce a controlled topography. The etching duration was varied and its effect on Ag content and dielectric properties were studied by employing atomic force microscopy (AFM), scanning electron microscopy and energy-dispersive X-ray spectroscopy (SEM-EDS), and impedance spectroscopy. The AFM studies revealed the presence of nanoscale ‘peaks’, which were distributed across the surface of the glass, that following etching showed enhanced capacitance. Surface modification of glass using self-organised nano-scale metal island masks is shown to be an effective route to enhance the use of ultra-thin glass in capacitor applications.