David Gehlhausen, S. Menezes, Lichuan Chen, Gyu-ho Kim, Hongbing Lu, Jinming Gao, Walter Hu
{"title":"Jet rollable nanoimprint lithography with piezoelectric jetting of resist","authors":"David Gehlhausen, S. Menezes, Lichuan Chen, Gyu-ho Kim, Hongbing Lu, Jinming Gao, Walter Hu","doi":"10.1109/NANO.2013.6720909","DOIUrl":null,"url":null,"abstract":"We report an jet rollable nanoimprint lithography tool as a low cost method to produce micro- and nano-structures rapidly over large areas. We integrated a piezoelectric nozzle to deposit resist in-line in a low-waste, high-precision manner. We demonstrate the capabilities of this system by creating a variety of microstructures in SU8 resist with high pattern transfer fidelity.","PeriodicalId":189707,"journal":{"name":"2013 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013)","volume":"47 31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NANO.2013.6720909","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract
We report an jet rollable nanoimprint lithography tool as a low cost method to produce micro- and nano-structures rapidly over large areas. We integrated a piezoelectric nozzle to deposit resist in-line in a low-waste, high-precision manner. We demonstrate the capabilities of this system by creating a variety of microstructures in SU8 resist with high pattern transfer fidelity.
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