{"title":"Lithography - \"The technology to he used is ????\"","authors":"R. Hill","doi":"10.1364/sxray.1992.ma2","DOIUrl":null,"url":null,"abstract":"There is great indecision in the semiconductor industry as to what the lithography technology will be for the back half of the 1990's (1995-2000). When applied against an idealized process requirements model, all technologies have problems which make the choice extremely expensive and difficult. Technologies considered are: optical extensions, e beam technologies, ion beam technologies, and x-ray technologies. This paper discusses the main technologies with a description of the advantages and disadvantages.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1992.ma2","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
There is great indecision in the semiconductor industry as to what the lithography technology will be for the back half of the 1990's (1995-2000). When applied against an idealized process requirements model, all technologies have problems which make the choice extremely expensive and difficult. Technologies considered are: optical extensions, e beam technologies, ion beam technologies, and x-ray technologies. This paper discusses the main technologies with a description of the advantages and disadvantages.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
