3D SiC/Si normally-off MOSFET for high power high speed applications

Vamshi Veesam, Ramana Thakkallapally, I. Abdel-Motaleb, Zheng Shen
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Abstract

An optimized power system requires the integration of more than one technology. In this paper we present a 3D 3C-SiC/Si MOSFET, where high performance power devices can be integrated with low cost Si technology. Using the numerical analysis simulator Silvaco Atlas to simulate the device performance, it was found that these devices can provide double the current while occupying less than 33% of the substrate area of a lateral device with the same gate length and width. The device simulation shows that the breakdown voltage can reach 265V and the drain current can reach 0.5 A/mm at Vg =4 V. The stability of this device with temperature makes it an excellent candidate for high power applications.
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用于高功率高速应用的3D SiC/Si常关式MOSFET
一个优化的电力系统需要多种技术的集成。在本文中,我们提出了一种3D 3C-SiC/Si MOSFET,其中高性能功率器件可以与低成本Si技术集成。利用数值分析模拟器Silvaco Atlas对器件性能进行模拟,发现在相同栅极长度和宽度的情况下,这些器件可以提供两倍的电流,而占用的衬底面积不到横向器件的33%。器件仿真结果表明,在Vg =4 V时击穿电压可达265V,漏极电流可达0.5 A/mm。该器件随温度的稳定性使其成为高功率应用的绝佳候选者。
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