Design of Ku-band SiGe-HBT power amplifier with through-silicon-via applying 3-D EM simulation

Guoxiao Cheng, Zhiqun Li, Lei Luo, Yan Yao, Xiao-Hu He, Boyong He
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Abstract

This paper presents a power amplifier (PA) for Ku-band T/R modules using 0.13-wm SiGe BiCMOS process technology with through-silicon-via (TSV). The proposed PA is composed of two cascode stages using high performance (HP) SiGe HBTs to achieve a high gain and a relatively high output power. The TSV is utilized to provide a low-resistance and low-inductance path to the ground. And the 3-D electro-magnetic (EM) simulation is applied to narrow the gap between the simulated and the measured results. The proposed PA achieves a small-signal gain of 27dB with a 3-dB bandwidth covering from 14.8GHz to 18.2GHz. The output 1dB compression point (OP1dB) and the peak power-added efficiency (PAE) are 21.4dBm and 16.7% at 15GHz respectively.
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应用三维电磁仿真设计ku波段SiGe-HBT通硅功率放大器
本文提出了一种用于ku波段T/R模块的功率放大器(PA),该放大器采用0.13 wm SiGe BiCMOS工艺,采用通硅孔(TSV)。该放大器由两个级联码组成,采用高性能(HP) SiGe hbt来实现高增益和相对较高的输出功率。TSV是用来提供一个低电阻和低电感的路径到地面。利用三维电磁仿真技术,缩小了仿真结果与实测结果之间的差距。该放大器的小信号增益为27dB,带宽为3db,覆盖14.8GHz至18.2GHz。15GHz时的输出1dB压缩点(OP1dB)和峰值功率附加效率(PAE)分别为21.4dBm和16.7%。
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