Ballistic performance comparison of InGaSb and InAsSb XOI nFET

M. N. Alam, M. Islam, Md.R. Islam
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Abstract

Ballistic performance of nanoscale InGaSb and InAsSb XOI n-FET is compared using non equilibrium greens function (NEGF) method. The simulation results demonstrate that the ballistic performance is opposite to what is expected if the devices were long channel MOSFET. Although InAsSb possesses higher bulk electron mobility, but in ballistic regime, InGaSb gives higher drain current along with better subthreshold characteristic and reduced threshold voltage, if the off state current for both material is made equal.
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InGaSb和InAsSb XOI nFET的弹道性能比较
采用非平衡格林函数(non - equilibrium greens function, NEGF)方法对InGaSb和InAsSb XOI n-FET的弹道性能进行了比较。仿真结果表明,如果器件是长沟道MOSFET,则其弹道性能与预期相反。虽然inasb具有更高的体电子迁移率,但在弹道状态下,如果使两种材料的关断电流相等,InGaSb具有更高的漏极电流以及更好的亚阈值特性和降低的阈值电压。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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