Cellular Monte Carlo study lateral scaling impact of on the DC-RF performance of high-power GaN HEMTs

R. Soligo, D. Guerra, D. Ferry, S. Goodnick, M. Saraniti
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引用次数: 5

Abstract

The effects of access region scaling on the performance of millimeter-wave GaN HEMTs is investigated through nanoscale carrier dynamics description obtained by full band Cellular Monte Carlo simulation. The drain current and transconductance have shown to increase monotonically up to respectively 5500 mA/mm and 1500 mS/mm by symmetrically scaling the source to gate and gate to drain distance from 635 nm to 50 nm. The electric field distribution has been studied for the shorter access regions and it was seen to be still far from the GaN breakdown limit. The access region scaling is found to greatly improve the frequency response of the device as well: from 340 GHz up to 860 GHz. Detailed simulation of the carrier dynamics in the area under the gate showed that these improvements are due to higher transit velocity of electrons at the source end of the gate.
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蜂窝蒙特卡罗研究了横向标度对大功率GaN hemt直流-射频性能的影响
通过全频段蜂窝蒙特卡罗模拟得到的纳米载流子动力学描述,研究了接入区域缩放对毫米波GaN hemt性能的影响。通过对称地缩放源极和栅极到漏极的距离从635 nm到50 nm,漏极电流和跨导率分别单调增加到5500 mA/mm和1500 mS/mm。研究了较短进入区域的电场分布,发现距离氮化镓击穿极限还很远。发现接入区域缩放也大大改善了设备的频率响应:从340 GHz到860 GHz。栅极下区域载流子动力学的详细模拟表明,这些改进是由于栅极源端的电子传输速度更高。
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