{"title":"PTFTs with blends of P3HT:F8T2","authors":"M. Avila, F. Ulloa, J. Sánchez, M. Estrada","doi":"10.1109/ICCDCS.2012.6188917","DOIUrl":null,"url":null,"abstract":"In this paper, we characterize MIS structures and PTFTs made with blends of P3HT:F8T2 as active layer and PMMA as dielectric. The properties of the interface between the dielectric and the active layer are analyzed using CV curves and compared to those obtained for P3HT and F8T2 as active layer. Mobility and its dependence with gate voltage, the distribution of states DOS in the active layer of the PTFTs and other device parameters were obtained and analyzed. It was found that the characteristic temperature of the distribution of States, DOS in P3HT is the lowest, increasing slightly for the blend, but quite significant in F8T2 PTFTs, while the density of localized states is highest for the blend. Mobility resulted lower than for P3HT devices, but higher than for F8T2. The interface density of states also increases.","PeriodicalId":125743,"journal":{"name":"2012 8th International Caribbean Conference on Devices, Circuits and Systems (ICCDCS)","volume":"166 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-03-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 8th International Caribbean Conference on Devices, Circuits and Systems (ICCDCS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICCDCS.2012.6188917","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
In this paper, we characterize MIS structures and PTFTs made with blends of P3HT:F8T2 as active layer and PMMA as dielectric. The properties of the interface between the dielectric and the active layer are analyzed using CV curves and compared to those obtained for P3HT and F8T2 as active layer. Mobility and its dependence with gate voltage, the distribution of states DOS in the active layer of the PTFTs and other device parameters were obtained and analyzed. It was found that the characteristic temperature of the distribution of States, DOS in P3HT is the lowest, increasing slightly for the blend, but quite significant in F8T2 PTFTs, while the density of localized states is highest for the blend. Mobility resulted lower than for P3HT devices, but higher than for F8T2. The interface density of states also increases.