{"title":"Effect of Heat Treatment on the Photosensitive Structures CuInSe2","authors":"A. Matiev","doi":"10.1109/SOPO.2012.6271138","DOIUrl":null,"url":null,"abstract":"Photosensitive structures were produced by heat treatment of polycrystalline p - and n - CuInSe2 in vacuum and in air polycrystalline substrates at temperatures near 500°C. The spectral dependence of photosensitivity of the two types of structures in natural and linearly polarized radiation were investigated and analyzed. T photosensitivity of the best structures reaches 16 mA/W at T = 300 K. The laws of polarization photosensitivity of such structures were determined and discussed in relation to the fabrication conditions of the structures. It was concluded that there is a new possibility of using polarized photoelectric spectroscopy for diagnostics of phase interactions in complex semiconductors and for optimizing the technology for producing photoconversion structures.","PeriodicalId":159850,"journal":{"name":"2012 Symposium on Photonics and Optoelectronics","volume":"74 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 Symposium on Photonics and Optoelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOPO.2012.6271138","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Photosensitive structures were produced by heat treatment of polycrystalline p - and n - CuInSe2 in vacuum and in air polycrystalline substrates at temperatures near 500°C. The spectral dependence of photosensitivity of the two types of structures in natural and linearly polarized radiation were investigated and analyzed. T photosensitivity of the best structures reaches 16 mA/W at T = 300 K. The laws of polarization photosensitivity of such structures were determined and discussed in relation to the fabrication conditions of the structures. It was concluded that there is a new possibility of using polarized photoelectric spectroscopy for diagnostics of phase interactions in complex semiconductors and for optimizing the technology for producing photoconversion structures.