{"title":"Design and development of back reflectors for improved light coupling and absorption enhancement in thin MQW solar cells","authors":"Wei Wang, A. Freundlich","doi":"10.1117/12.2078669","DOIUrl":null,"url":null,"abstract":"Optimization of non-planar antireflective coating and back- (or front-) surface texturing are widely studied to further reduce the reflection losses and increase the sunlight absorption path in solar cells. Back reflectors have been developed from perfect mirror to textured mirror in order to further increase light path, which can significantly improve the efficiency and allow for much thinner devices. A Lambertian surface, which has the most random texture, can theoretically raise the light path to 4n2 times that of a smooth surface. It’s a challenge however to fabricate ideal Lambertian texture, especially in a fast and low cost way. In this work we have developed a method to overcome this challenge that combines the use of laser interference lithography (LIL) and selective wet etching. The approach allows for a rapid wafer scale texture processing with sub-wavelength (nano)- scale control of the pattern and the pitch. The technique appears as being particularly attractive for the development of ultra-thin III-V devices, or in overcoming the weak sub-bandgap absorption in devices incorporating quantum dots or quantum wells. Preliminary results on the application of the technique for the development of back reflector for 1-1.3 eV (MQW bearing) GaAs solar cells are presented.","PeriodicalId":432115,"journal":{"name":"Photonics West - Optoelectronic Materials and Devices","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-03-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Photonics West - Optoelectronic Materials and Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2078669","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Optimization of non-planar antireflective coating and back- (or front-) surface texturing are widely studied to further reduce the reflection losses and increase the sunlight absorption path in solar cells. Back reflectors have been developed from perfect mirror to textured mirror in order to further increase light path, which can significantly improve the efficiency and allow for much thinner devices. A Lambertian surface, which has the most random texture, can theoretically raise the light path to 4n2 times that of a smooth surface. It’s a challenge however to fabricate ideal Lambertian texture, especially in a fast and low cost way. In this work we have developed a method to overcome this challenge that combines the use of laser interference lithography (LIL) and selective wet etching. The approach allows for a rapid wafer scale texture processing with sub-wavelength (nano)- scale control of the pattern and the pitch. The technique appears as being particularly attractive for the development of ultra-thin III-V devices, or in overcoming the weak sub-bandgap absorption in devices incorporating quantum dots or quantum wells. Preliminary results on the application of the technique for the development of back reflector for 1-1.3 eV (MQW bearing) GaAs solar cells are presented.
为了进一步降低太阳能电池的反射损失,增加太阳能电池的吸收路径,人们对非平面减反射涂层的优化和背面(或正面)表面纹理进行了广泛的研究。为了进一步增加光路,后反射镜已经从完美镜发展到纹理镜,这可以显着提高效率并允许更薄的设备。一个具有最随机纹理的朗伯曲面,理论上可以将光路提高到光滑表面的4n2倍。然而,制造理想的兰伯氏纹理是一个挑战,特别是在快速和低成本的方式。在这项工作中,我们已经开发了一种方法来克服这一挑战,结合使用激光干涉光刻(LIL)和选择性湿法蚀刻。该方法允许快速晶圆尺度纹理处理与亚波长(纳米)尺度控制的图案和间距。该技术对于超薄III-V器件的开发,或在克服包含量子点或量子阱的器件的弱亚带隙吸收方面显得特别有吸引力。介绍了该技术在1-1.3 eV (MQW轴承)GaAs太阳能电池背反射器研制中的初步应用结果。