Influence of penetrating radiations on electrical low frequency noise of semiconductors

B. Yakubovich
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Abstract

The influence of penetrating radiations on the electrical low-frequency noise of semiconductors is studied. Expression is calculated that determines the number of structural defects in semiconductors arising from exposure to penetrating radia-tion. General form expression is calculated for the spectrum of electrical low-frequency noise in semiconductors when exposed to penetrating radiation. Quanti-tative relationship was established between the spectrum of electrical low-frequency noise and the development of disturbances in the structure of semicon-ductors caused by penetrating radiations. The results obtained can be used to de-termine the spectra of electrical noise in semiconductors of various types and in numerous semiconductor devices. The results of the article have practical applica-tions. Calculated expressions allow to make estimates of the intensity of electrical low-frequency noise, from which conclusions can be drawn about possibility of functioning and reliability of semiconductor devices. Established relationship be-tween electrical noise and radiation defects can be used to estimate, based on spec-tral characteristics of the noise, the defectiveness of structure of semiconductors subjected to radiation damage.
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穿透辐射对半导体电低频噪声的影响
研究了穿透辐射对半导体电低频噪声的影响。计算了由于暴露于穿透辐射而产生的半导体结构缺陷的数量。计算了半导体在穿透辐射作用下的低频噪声谱的一般形式表达式。建立了电低频噪声谱与穿透辐射引起的半导体结构扰动发展之间的定量关系。所得结果可用于确定各种类型的半导体和许多半导体器件中的电噪声谱。本文的研究结果具有实际应用价值。计算表达式允许对低频噪声的强度进行估计,从中可以得出关于半导体器件功能的可能性和可靠性的结论。建立了电噪声与辐射缺陷之间的关系,可以根据噪声的光谱特征来估计受到辐射损伤的半导体结构的缺陷。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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