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The analysis of the errors of the dynamic interferometry method in the control of local surface inhomogeneities of the nanometer level of the profiles of optical parts 分析了动态干涉法在光学零件纳米级轮廓局部表面不均匀性控制中的误差
Pub Date : 2022-03-11 DOI: 10.51368/2307-4469-2022-10-1-71-89
D. Denisov, M. Ustyugova, V. Frolova, Denis Mashoshin, Ismail Gafarov
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引用次数: 0
Influence of flash ignition mechanism of high-current pulsed xenon discharge on the optical degradation of the quartz shell in the UV region of the spectrum 大电流脉冲氙气放电的闪燃机理对石英壳紫外区光学降解的影响
Pub Date : 2022-03-11 DOI: 10.51368/2307-4469-2022-10-1-90-96
S. Kireev, S. Gavrish, S. Shashkovskiy
{"title":"Influence of flash ignition mechanism of high-current pulsed xenon discharge on the optical degradation of the quartz shell in the UV region of the spectrum","authors":"S. Kireev, S. Gavrish, S. Shashkovskiy","doi":"10.51368/2307-4469-2022-10-1-90-96","DOIUrl":"https://doi.org/10.51368/2307-4469-2022-10-1-90-96","url":null,"abstract":"","PeriodicalId":228648,"journal":{"name":"ADVANCES IN APPLIED PHYSICS","volume":"75 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121581703","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analysis of the test results of visualization means of various spectrum ranges for the detection of a fire source and a person in the fire training complex PTS «Ugolyok» 分析各种光谱范围的可视化手段的测试结果,用于检测火源和消防训练综合体PTS«Ugolyok»中的人员
Pub Date : 2022-03-11 DOI: 10.51368/2307-4469-2022-10-1-63-70
M. Aleshkov, S. Popov, N. Topolskiy, A. Mokshantsev, Kiril Mikhaylov, D. Afanasov, K. Samsonov, K. Khamidullin, L. Iftodi
{"title":"Analysis of the test results of visualization means of various spectrum ranges for the detection of a fire source and a person in the fire training complex PTS «Ugolyok»","authors":"M. Aleshkov, S. Popov, N. Topolskiy, A. Mokshantsev, Kiril Mikhaylov, D. Afanasov, K. Samsonov, K. Khamidullin, L. Iftodi","doi":"10.51368/2307-4469-2022-10-1-63-70","DOIUrl":"https://doi.org/10.51368/2307-4469-2022-10-1-63-70","url":null,"abstract":"","PeriodicalId":228648,"journal":{"name":"ADVANCES IN APPLIED PHYSICS","volume":"55 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126939784","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Infrared reflectography of artworks with SWIR camera at wavelengths of 0.9–1.7 um 用SWIR相机对艺术品进行波长为0.9-1.7 um的红外反射
Pub Date : 2022-03-10 DOI: 10.51368/2307-4469-2022-10-1-23-33
V. Popov, D. Pershin, P. Khrabrov, E. Morozova, Vladimir Ponomarenko
{"title":"Infrared reflectography of artworks with SWIR camera at wavelengths of 0.9–1.7 um","authors":"V. Popov, D. Pershin, P. Khrabrov, E. Morozova, Vladimir Ponomarenko","doi":"10.51368/2307-4469-2022-10-1-23-33","DOIUrl":"https://doi.org/10.51368/2307-4469-2022-10-1-23-33","url":null,"abstract":"","PeriodicalId":228648,"journal":{"name":"ADVANCES IN APPLIED PHYSICS","volume":"272 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-03-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115963490","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Multilayer interference coatings on the basis of the layers of silicon and dioxide of silicon on the thinning InSb FPA with increased mechanical strength and reproducibility 多层干涉涂层在硅层和二氧化硅层的基础上减薄了InSb FPA,提高了机械强度和再现性
Pub Date : 2022-03-10 DOI: 10.51368/2307-4469-2022-10-1-14-22
Alekcey Lopukhin, K. Boltar, A. Grishina, S. Shishigin
{"title":"Multilayer interference coatings on the basis of the layers of silicon and dioxide of silicon on the thinning InSb FPA with increased mechanical strength and reproducibility","authors":"Alekcey Lopukhin, K. Boltar, A. Grishina, S. Shishigin","doi":"10.51368/2307-4469-2022-10-1-14-22","DOIUrl":"https://doi.org/10.51368/2307-4469-2022-10-1-14-22","url":null,"abstract":"","PeriodicalId":228648,"journal":{"name":"ADVANCES IN APPLIED PHYSICS","volume":"29 1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-03-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129534232","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The recent progress of the semiconductor silicon technology (a review) 半导体硅技术的最新进展(综述)
Pub Date : 2022-03-10 DOI: 10.51368/2307-4469-2022-10-1-34-52
A. Naumov, D. Orekhov, N. Kulchitsky
{"title":"The recent progress of the semiconductor silicon technology \u0000(a review)","authors":"A. Naumov, D. Orekhov, N. Kulchitsky","doi":"10.51368/2307-4469-2022-10-1-34-52","DOIUrl":"https://doi.org/10.51368/2307-4469-2022-10-1-34-52","url":null,"abstract":"","PeriodicalId":228648,"journal":{"name":"ADVANCES IN APPLIED PHYSICS","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-03-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127750461","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Photoluminescence of polymethyl methacrylate excited by a KrCl excilamp and a KrCl laser KrCl激光放大器和KrCl激光器激发的聚甲基丙烯酸甲酯的光致发光
Pub Date : 2022-03-10 DOI: 10.51368/2307-4469-2022-10-1-5-13
Alexander Burachenko, V. Tarasenko, D. Genin, Alekcey Puchikin
,
{"title":"Photoluminescence of polymethyl methacrylate excited by a KrCl excilamp and a KrCl laser","authors":"Alexander Burachenko, V. Tarasenko, D. Genin, Alekcey Puchikin","doi":"10.51368/2307-4469-2022-10-1-5-13","DOIUrl":"https://doi.org/10.51368/2307-4469-2022-10-1-5-13","url":null,"abstract":",","PeriodicalId":228648,"journal":{"name":"ADVANCES IN APPLIED PHYSICS","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-03-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127810317","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Specifics of measuring temperature-frequency characteristics of high-sensitive staring thermal imagers 高灵敏度凝视热成像仪测量温度-频率特性的细节
Pub Date : 2022-03-10 DOI: 10.51368/2307-4469-2022-10-1-53-62
V. Ovsyannikov, Ya. V. Ovsyannikov
{"title":"Specifics of measuring temperature-frequency characteristics of high-sensitive staring thermal imagers","authors":"V. Ovsyannikov, Ya. V. Ovsyannikov","doi":"10.51368/2307-4469-2022-10-1-53-62","DOIUrl":"https://doi.org/10.51368/2307-4469-2022-10-1-53-62","url":null,"abstract":"","PeriodicalId":228648,"journal":{"name":"ADVANCES IN APPLIED PHYSICS","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-03-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122226210","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Mesa-structures and Focal Plane Arrays based on epitaxially grown InSb layers 基于外延生长InSb层的台面结构和焦平面阵列
Pub Date : 2021-12-24 DOI: 10.51368/2307-4469-2021-9-6-513-522
K. Boltar, A. Lopuhin, P. Vlasov, N. Iakovleva
Aspects of epitaxially grown indium antimonide (InSb) on InSb substrates (InSb-on-InSb) by molecular beam epitaxy (MBE) for the 2D focal plane arrays fabrication process have been described. The epitaxial growth offers possibility for complex structure production, and then such structures suppose more effective control of the thermal generation charge carriers as the detector temperature is raised above 80 K. Investigations of mid-wave infrared (MWIR) 320256 FPAs with 30 μm pitch and 640512 FPAs with 15 μm pitch based on InSb-on-InSb layers have shown high performance: the average detectivity at T = 77 K more than 21011 cmW-1Hz1/2, the average value of noise equivalent temperature difference (NETD) with a cold aperture of 60o at T = 77K was in the range of 10–20 mK. High quality thermal imaging images were obtained in real time mode.
本文介绍了分子束外延法(MBE)在InSb衬底上外延生长锑化铟(InSb-on-InSb)用于二维焦平面阵列制造工艺的各个方面。外延生长为复杂结构的产生提供了可能,当探测器温度高于80 K时,这种结构对热生成载流子的控制更有效。基于InSb-on-InSb层的320256个30 μm节距fpa和640512个15 μm节距fpa的中波红外(MWIR)研究表明,在T = 77K时的平均探测率大于21011 cmW-1Hz1/2,在T = 77K时冷孔径为60的噪声等效温差(NETD)的平均值在10-20 mK范围内,获得了高质量的实时热成像图像。
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引用次数: 1
Ensuring uniform thickness of the conductive coating on the inner surface of the hemispherical resonator by magnetron sputtering 利用磁控溅射技术确保半球形谐振器内表面导电涂层厚度均匀
Pub Date : 2021-12-24 DOI: 10.51368/2307-4469-2021-9-6-523-532
V. Kondratenko, G. Sagatelyan, A. Shishlov, Mikhail Bilinkin
The possibilities of technological ensuring of the uniformity of thickness distribution of a thin-film metal coating produced by magnetron sputtering on the inner surface of a thinwalled silica resonator made in the shape of a hemisphere are considered. The possibility of minimizing the thickness of the coating by optimizing the diameter of the annular magnetron emission zone in combination with the distance from the resonator to the target made of sprayed material is shown. A further increase in the evenness of thickness of the coating is possible on the basis of the use of a fixed screen with a hole, the shape and location of which are calculated analytically, and the final configuration of the contour is specified empirically
讨论了磁控溅射法制备半球形硅薄壁腔内表面金属涂层厚度均匀性的技术可能性。通过优化环形磁控管发射区的直径,结合谐振腔与喷射材料制成的靶材之间的距离,给出了使涂层厚度最小化的可能性。在使用带孔的固定筛的基础上,进一步增加涂层厚度的均匀性是可能的,孔的形状和位置是分析计算的,轮廓的最终配置是经验指定的
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引用次数: 0
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