{"title":"Texture Analysis","authors":"A. Distante, C. Distante","doi":"10.1002/9781119356080.ch8","DOIUrl":null,"url":null,"abstract":"Chip manufacturing company moves from Al interconnects into Cu-based technology. Now the task is to establish proper conditions for the Cu film growth on Si. Number of samples, Cu on Si(001), were grown at different temperatures and using different Cu growth rates. You were given one of the many samples, Cu on Si(001). Your assignment consists in: 1) determining a preferred orientation along c-axis (preferred out-ofplane orientation) of Cu film and 2) determining the in-plane orientation of the layer with respect to the Si substrate.","PeriodicalId":257719,"journal":{"name":"Handbook of Image Processing and Computer Vision","volume":"75 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1726","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Handbook of Image Processing and Computer Vision","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1002/9781119356080.ch8","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1726
Abstract
Chip manufacturing company moves from Al interconnects into Cu-based technology. Now the task is to establish proper conditions for the Cu film growth on Si. Number of samples, Cu on Si(001), were grown at different temperatures and using different Cu growth rates. You were given one of the many samples, Cu on Si(001). Your assignment consists in: 1) determining a preferred orientation along c-axis (preferred out-ofplane orientation) of Cu film and 2) determining the in-plane orientation of the layer with respect to the Si substrate.
芯片制造公司从人工智能互连转向基于铜的技术。现在的任务是为Cu薄膜在Si上的生长建立合适的条件。Cu on Si(001)样品在不同温度和不同Cu生长速率下生长。你得到了许多样品中的一个，Cu on Si(001)。你的任务包括:1)确定Cu薄膜沿c轴的首选方向(首选面外方向)，2)确定相对于Si衬底层的面内方向。
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
