TCAD Simulation Research of the Single Event Burnout and Hardening in Power LDMOS Transistors

Yibo Lei, Jian Fang, Bo Zhang
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Abstract

In this paper, the Single-event burnout (SEB) triggering mechanism for LDMOS devices is numerically studied by using the 2D technology computer-aided design device simulator, simultaneously, a hardened LDMOS with an N-type doped plug inserting in the drain region is proposed for the first time. The SEB triggering mechanisms contain the amplification bipolar effect and following impact ionization in the high field region. By comparing the simulation results from conventional LDMOS and proposed NDP LDMOS, the carriers induced by heavy ion can be quickly absorbed to drain and source electrode through NDP layer, so that the proposed NDP LDMOS can achieve better SEB performance than conventional one. With a heavy ion having the linear energy transfer value of 0.2pC/$\mu$m striking vertically, SEB threshold voltage obtained in conventional LDMOS and hardened NDP LDMOS is 197V and 291V, respectively.
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大功率LDMOS晶体管单事件烧坏和硬化的TCAD仿真研究
本文利用二维技术计算机辅助设计器件模拟器对LDMOS器件的单事件烧坏(SEB)触发机制进行了数值研究,同时首次提出了在漏极区插入n型掺杂塞的硬化LDMOS器件。SEB触发机制包括放大双极效应和随后的高场冲击电离。对比传统LDMOS和NDP LDMOS的模拟结果,重离子诱导的载流子可以通过NDP层快速吸收到漏极和源极,因此NDP LDMOS具有比传统LDMOS更好的SEB性能。当线性能转移值为0.2pC/$\mu$m的重离子垂直撞击时,常规LDMOS和硬化NDP LDMOS的SEB阈值电压分别为197V和291V。
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