Silicon single-electron CCD

A. Fujiwara, Y. Takahashi
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Abstract

Single-electron (SE) devices have been attracting much attention because of their low power consumption and potential for novel functions based on the manipulation of a single charge. Silicon-on-insulator (SOI) wafers are the most feasible material for fabricating SE devices since Si nanostructures can be implemented by the nanolithography technique. We have already reported SE transistors, SE memories and coupled-island SE devices, which were fabricated by means of pattern-dependent oxidation (PADOX). Nevertheless, the ultimate operation, the manipulation of a single charge, such as in a SE pump, has not yet been realized in Si devices and remains a future subject. Here, we report a novel type of SE device, an ultrasmall charge-coupled device (CCD) on a SOI wafer. The fabricated prototype can transfer a single hole like a conventional CCD. We also demonstrate a new method of storing holes and sensing them on the level of a single charge.
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硅单电子CCD
单电子器件因其低功耗和基于单电荷操作的新功能而受到广泛关注。由于硅纳米结构可以通过纳米光刻技术实现,因此绝缘体上硅(SOI)晶圆是制造SE器件最可行的材料。我们已经报道了用模式依赖氧化(PADOX)方法制备SE晶体管、SE存储器和耦合岛SE器件。然而,最终的操作,单电荷的操纵,如在SE泵中,尚未在Si器件中实现,仍然是未来的主题。在这里,我们报告了一种新型的SE器件,一种在SOI晶圆上的超小型电荷耦合器件(CCD)。制作的原型可以像传统CCD一样转移一个单孔。我们还展示了一种在单电荷水平上存储空穴和感知它们的新方法。
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