Effects of atomicity and internal polarization on the electronic and optical properties of GaN/AlN quantum dots: Multimillion-atom coupled VFF MM-sp3 d5 s∗ tight-binding simulations

S. Sundaresan, K. Yalavarthi, S. Ahmed
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Abstract

Single-particle electronic structure and optical transition rates between the HOMO and LUMO states of a self-organized wurtzite GaN/AlN single quantum dot grown along the [0001] axis are calculated within an atomistic 20-band sp3 d5 s* tight-binding framework. The GaN/AlN quantum dot used in this computational study is realistically-sized (containing ~9 million atoms) and of truncated pyramid shape having height and base length of 4.5 nm and 23 nm, respectively. These reduced-dimensionality III-N structures are subject to competing effects of size-quantization and long-range internal fields that originate from: a) fundamental crystal atomicity and the interface discontinuity between two dissimilar materials; b) atomistically strained active region; c) strain-induced piezoelectricity; and d) spontaneous polarization (pyroelectricity). The mechano-electrical internal fields in the structure have been modeled using a combination of an atomistic valence force-field molecular mechanics (VFF MM) approach and a three-dimensional Poisson solver, and have found to strongly modulate the intrinsic single-particle electronic and optical properties of the quantum dots. In particular, in contrast to the well-studied InN/GaN systems, the effects of piezoelectric and pyroelectric fields add up (peak pyroelectric potential being larger than the piezoelectric counterpart) and result in a large redshift in the electronic bandgap near the Brillouin zone center (known as quantum confined stark effect), pronounced non-degeneracy in the excited states, strongly suppressed optical transition (increased recombination time), and anisotropic emission spectra.
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原子性和内部极化对GaN/AlN量子点电子和光学性质的影响:百万原子耦合VFF MM-sp3 d5 s∗紧密结合模拟
在原子20波段sp3 d5 s*紧密结合框架内,计算了沿[0001]轴生长的自组织纤纤ite GaN/AlN单量子点的HOMO和LUMO态之间的单粒子电子结构和光跃迁速率。本计算研究中使用的GaN/AlN量子点具有实际尺寸(包含约900万个原子)和截断金字塔形状,高度和底长分别为4.5 nm和23 nm。这些降维III-N结构受到尺寸量子化和远程内部场的竞争影响,这源于:a)基本晶体原子性和两种不同材料之间的界面不连续;B)原子应变活性区;C)应变压电;d)自发极化(热释电)。利用原子价力场分子力学(VFF MM)方法和三维泊松求解器的组合对结构中的机电内场进行了建模,并发现它们强烈地调节了量子点的固有单粒子电子和光学性质。特别是,与研究充分的InN/GaN系统相比,压电和热释电场的影响加在一起(峰值热释电势大于压电系统),导致布里温区中心附近电子带隙的大红移(称为量子受限斯塔克效应),激发态明显的非简并,强烈抑制光学跃迁(增加复合时间),以及各向异性发射光谱。
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