Tailoring plasmonic field enhancement in spatial and spectral domains

S. Juodkazis, L. Rosa, G. Gervinskas, E. Brasselet
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引用次数: 1

Abstract

Three-dimensional patterning of gold nano-particles on SiO2 and Si substrates is performed by ion-beam lithography with 15-20 nm resolution. Realization of an on-demand achiral and chiral modifications of nano-structures are demonstrated. Simulations of optical properties of the obtained nano-architectures reveal the possibility to tailor the field enhancement both in the spatial and spectral domains, which are foreseen to be applicable for light harvesting and opto-mechanics at nanoscale.
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在空间和谱域裁剪等离子体场增强
利用离子束光刻技术在SiO2和Si衬底上进行了金纳米颗粒的三维图像化,分辨率为15-20 nm。演示了纳米结构的按需非手性和手性修饰的实现。对所获得的纳米结构的光学性质的模拟揭示了在空间和光谱领域定制场增强的可能性,这被预见到可用于纳米尺度的光收集和光力学。
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