{"title":"Physical compact modeling of layout dependent metal resistance in integrated LDMOS power devices","authors":"M.L. Kniffin, R. Thoma, J. Victory","doi":"10.1109/ISPSD.2000.856799","DOIUrl":null,"url":null,"abstract":"Including the effects of parasitic metal resistance and their dependence on device layout is crucial to accurate modeling of large area LDMOS devices. This paper presents the derivation and use of compact analytical model equations for accurately predicting the Rdson performance of large area LDMOS devices. Results are compared with both numerical simulations and experimental measurements.","PeriodicalId":260241,"journal":{"name":"12th International Symposium on Power Semiconductor Devices & ICs. Proceedings (Cat. No.00CH37094)","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"12th International Symposium on Power Semiconductor Devices & ICs. Proceedings (Cat. No.00CH37094)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2000.856799","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
Including the effects of parasitic metal resistance and their dependence on device layout is crucial to accurate modeling of large area LDMOS devices. This paper presents the derivation and use of compact analytical model equations for accurately predicting the Rdson performance of large area LDMOS devices. Results are compared with both numerical simulations and experimental measurements.
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