Preparation and characterization of nickel oxide-based EGFET pH sensors

F. Lin, Hsi-Yen Chang, S. Hsiao, Huey-Ing Chen, Wen-Chau Liu
{"title":"Preparation and characterization of nickel oxide-based EGFET pH sensors","authors":"F. Lin, Hsi-Yen Chang, S. Hsiao, Huey-Ing Chen, Wen-Chau Liu","doi":"10.1109/ICSENST.2015.7438430","DOIUrl":null,"url":null,"abstract":"NiO films based extended gate field-effect transistor (EGFET) pH sensors were fabricated and investigated in this work. Experimentally, nickel oxide (NiO) nanoparticles were first prepared via precipitation method. Subsequently, the NiO film was deposited on the FTO glass substrate by spin-coating. In the precipitation of NiO, two precipitants, NaOH and NH4OH solutions, were used. The influences of preparation conditions including precipitant, coating number, and calcination temperature on the properties of NiO films and pH sensing performances of devices were investigated. From experimental results, it was found that the NaOH-derived NiO devices exhibited superior sensing performances than the NH4OH-derived ones, due to their smaller grain size and denser packing of NiO film. It also revealed that, a highest sensitivity of 53.40 mV/pH was achieved in the pH range from 2 to 12 with a good linearity of 0.9989, which was fabricated with a precipitant of NaOH solution, a coating number of 10, and a calcination temperature of 400°C. Moreover, the device showed a negligible hysteresis effect.","PeriodicalId":375376,"journal":{"name":"2015 9th International Conference on Sensing Technology (ICST)","volume":"2013 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 9th International Conference on Sensing Technology (ICST)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSENST.2015.7438430","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8

Abstract

NiO films based extended gate field-effect transistor (EGFET) pH sensors were fabricated and investigated in this work. Experimentally, nickel oxide (NiO) nanoparticles were first prepared via precipitation method. Subsequently, the NiO film was deposited on the FTO glass substrate by spin-coating. In the precipitation of NiO, two precipitants, NaOH and NH4OH solutions, were used. The influences of preparation conditions including precipitant, coating number, and calcination temperature on the properties of NiO films and pH sensing performances of devices were investigated. From experimental results, it was found that the NaOH-derived NiO devices exhibited superior sensing performances than the NH4OH-derived ones, due to their smaller grain size and denser packing of NiO film. It also revealed that, a highest sensitivity of 53.40 mV/pH was achieved in the pH range from 2 to 12 with a good linearity of 0.9989, which was fabricated with a precipitant of NaOH solution, a coating number of 10, and a calcination temperature of 400°C. Moreover, the device showed a negligible hysteresis effect.
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氧化镍基EGFET pH传感器的制备与表征
本文制作并研究了基于NiO薄膜的扩展栅场效应晶体管(EGFET) pH传感器。实验上首次采用沉淀法制备了氧化镍纳米颗粒。随后,通过旋转镀膜将NiO薄膜沉积在FTO玻璃基板上。在NiO的沉淀中,使用了NaOH和NH4OH两种沉淀剂。考察了沉淀剂、镀层数量、煅烧温度等制备条件对NiO薄膜性能和器件pH传感性能的影响。实验结果表明,naoh衍生NiO器件的晶粒尺寸更小,NiO薄膜的堆积密度更大,传感性能优于nh4oh衍生NiO器件。结果表明,在pH为2 ~ 12的范围内,以NaOH溶液为沉淀剂,包覆数为10,煅烧温度为400℃,在0.9989的良好线性关系下,该材料的灵敏度最高,为53.40 mV/pH。此外,该装置的迟滞效应可以忽略不计。
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